The directed self-assembly (DSA) method of patterning for microelectronics uses polymer phase-separation to generate features of less than 20nm, with the positions of self-assembling materials externally guided into the desired pattern. Directed self-assembly of Block Co-polymers for Nano-manufacturing reviews the design, production, applications and future developments needed to facilitate the widescale adoption of this promising technology.
Beginning with a solid overview of the physics and chemistry of block copolymer (BCP) materials, Part 1 covers the synthesis of new materials and new processing methods for DSA. Part 2 then goes on to outline the key modelling and characterization principles of DSA, reviewing templates and patterning using topographical and chemically modified surfaces, line edge roughness and dimensional control, x-ray scattering for characterization, and nanoscale driven assembly. Finally, Part 3 discusses application areas and related issues for DSA in nano-manufacturing, including for basic logic circuit design, the inverse DSA problem, design decomposition and the modelling and analysis of large scale, template self-assembly manufacturing techniques.
| ISBN: | 9780081002506 |
| Publication date: | 10th August 2015 |
| Author: | Roel Gronheid, Paul Nealey |
| Publisher: | Woodhead Publishing an imprint of Elsevier Science |
| Format: | Hardback |
| Pagination: | 328 pages |
| Series: | Woodhead Publishing Series in Electronic and Optical Materials |
| Genres: |
Materials science Engineering applications of polymers and composites Plastics and polymers Textiles and fibres |
The directed self-assembly (DSA) method of patterning for microelectronics uses polymer phase-separation to generate features of less than 20nm, with the positions of self-assembling materials externally guided into the desired pattern. Directed self-assembly of Block Co-polymers for Nano-manufacturing reviews the design, production, applications and future developments needed to facilitate the widescale adoption of this promising technology.
Beginning with a solid overview of the physics and chemistry of block copolymer (BCP) materials, Part 1 covers the synthesis of new materials and new processing methods for DSA. Part 2 then goes on to outline the key modelling and characterization principles of DSA, reviewing templates and patterning using topographical and chemically modified surfaces, line edge roughness and dimensional control, x-ray scattering for characterization, and nanoscale driven assembly. Finally, Part 3 discusses application areas and related issues for DSA in nano-manufacturing, including for basic logic circuit design, the inverse DSA problem, design decomposition and the modelling and analysis of large scale, template self-assembly manufacturing techniques.
Directed Self-Assembly of Block Co-Polymers for Nano-Manufacturing features in the following genres: Materials science, Engineering applications of polymers and composites, Plastics and polymers, Textiles and fibres
Directed Self-Assembly of Block Co-Polymers for Nano-Manufacturing is available in Hardback
Directed Self-Assembly of Block Co-Polymers for Nano-Manufacturing was written by Roel Gronheid, Paul Nealey and published by Woodhead Publishing an imprint of Elsevier Science
Directed Self-Assembly of Block Co-Polymers for Nano-Manufacturing has 328 pages
Yes it is part of Woodhead Publishing Series in Electronic and Optical Materials series
£146.70