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Resolution Enhancement Techniques in Optical Lithography

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Resolution Enhancement Techniques in Optical Lithography Synopsis

The acceleration of integrated circuit miniaturization is challenging lithographers to push the limits of optical lithography by ever more precise engineering and innovations. As IC device dimensions grow smaller, circuits outpace the introduction of shorter exposure wavelengths and higher numerical aperture lenses, increasing the importance of resolution enhancement techniques. This work summarizes the latest enhancement research that has matured since the 1980s. Theoretical and practical aspects of commonly used techniques are discussed, serving students and practising lithographers alike. #Conoptical Imaging And Resolution; Modified Illumination; Optical Proximity Correction; Alternating Phase-Shifting Mask; Attenuated Phase-Shifting Mask; Selecting Appropriate Rets; Second Generation Rets; Concluding Remarks.

About This Edition

ISBN: 9780819439956
Publication date:
Author: Alfred KwokKit Wong
Publisher: SPIE an imprint of SPIE Press
Format: Paperback
Pagination: 214 pages
Series: Tutorial Texts in Optical Engineering
Genres: Electronics: circuits and components
Optical physics