CMOS Past, Present and Future provides insight from the basics, to the state-of-the-art of CMOS processing and electrical characterization, including the integration of Group IV semiconductors-based photonics. The book goes into the pitfalls and opportunities associated with the use of hetero-epitaxy on silicon with strain engineering and the integration of photonics and high-mobility channels on a silicon platform. It begins with the basic definitions and equations, but extends to present technologies and challenges, creating a roadmap on the origins of the technology and its evolution to the present, along with a vision for future trends. The book examines the challenges and opportunities that materials beyond silicon provide, including a close look at high-k materials and metal gate, strain engineering, channel material and mobility, and contacts. The book's key approach is on characterizations, device processing and electrical measurements.
| ISBN: | 9780081021392 |
| Publication date: | 5th April 2018 |
| Author: | Henry Royal Institute of Technology, Stockholm, Sweden Radamson, Eddy Interuniversity Microelectronics Center IMEC Simoen |
| Publisher: | Woodhead Publishing Ltd an imprint of Elsevier Science & Technology |
| Format: | Paperback |
| Pagination: | 278 pages |
| Series: | Woodhead Publishing Series in Electronic and Optical Materials |
| Genres: |
Electronics engineering |
CMOS Past, Present and Future provides insight from the basics, to the state-of-the-art of CMOS processing and electrical characterization, including the integration of Group IV semiconductors-based photonics. The book goes into the pitfalls and opportunities associated with the use of hetero-epitaxy on silicon with strain engineering and the integration of photonics and high-mobility channels on a silicon platform. It begins with the basic definitions and equations, but extends to present technologies and challenges, creating a roadmap on the origins of the technology and its evolution to the present, along with a vision for future trends. The book examines the challenges and opportunities that materials beyond silicon provide, including a close look at high-k materials and metal gate, strain engineering, channel material and mobility, and contacts. The book's key approach is on characterizations, device processing and electrical measurements.
CMOS Past, Present and Future features in the following genres: Electronics engineering
CMOS Past, Present and Future is available in Paperback
CMOS Past, Present and Future was written by Henry Royal Institute of Technology, Stockholm, Sweden Radamson, Eddy Interuniversity Microelectronics Center IMEC Simoen and published by Woodhead Publishing Ltd an imprint of Elsevier Science & Technology
CMOS Past, Present and Future has 278 pages
Yes it is part of Woodhead Publishing Series in Electronic and Optical Materials series