Advanced techniques for characterizing thin film growth in situ help to develop improved understanding and faster diagnosis of issues with the process. In situ characterization of thin film growth reviews current and developing techniques for characterizing the growth of thin films, covering an important gap in research.Part one covers electron diffraction techniques for in situ study of thin film growth, including chapters on topics such as reflection high-energy electron diffraction (RHEED) and inelastic scattering techniques. Part two focuses on photoemission techniques, with chapters covering ultraviolet photoemission spectroscopy (UPS), X-ray photoelectron spectroscopy (XPS) and in situ spectroscopic ellipsometry for characterization of thin film growth. Finally, part three discusses alternative in situ characterization techniques. Chapters focus on topics such as ion beam surface characterization, real time in situ surface monitoring of thin film growth, deposition vapour monitoring and the use of surface x-ray diffraction for studying epitaxial film growth.With its distinguished editors and international team of contributors, In situ characterization of thin film growth is a standard reference for materials scientists and engineers in the electronics and photonics industries, as well as all those with an academic research interest in this area.
| ISBN: | 9781845699345 |
| Publication date: | 5th October 2011 |
| Author: | Gertjan Professor, MESA+ Institute for Nanotechnology,University of Twente, Enschede, The Netherlands Koster |
| Publisher: | Woodhead Publishing Ltd an imprint of Elsevier Science & Technology |
| Format: | Hardback |
| Pagination: | 296 pages |
| Series: | Woodhead Publishing Series in Electronic and Optical Materials |
| Genres: |
Materials science Electronic devices and materials Electronics engineering |
Advanced techniques for characterizing thin film growth in situ help to develop improved understanding and faster diagnosis of issues with the process. In situ characterization of thin film growth reviews current and developing techniques for characterizing the growth of thin films, covering an important gap in research.Part one covers electron diffraction techniques for in situ study of thin film growth, including chapters on topics such as reflection high-energy electron diffraction (RHEED) and inelastic scattering techniques. Part two focuses on photoemission techniques, with chapters covering ultraviolet photoemission spectroscopy (UPS), X-ray photoelectron spectroscopy (XPS) and in situ spectroscopic ellipsometry for characterization of thin film growth. Finally, part three discusses alternative in situ characterization techniques. Chapters focus on topics such as ion beam surface characterization, real time in situ surface monitoring of thin film growth, deposition vapour monitoring and the use of surface x-ray diffraction for studying epitaxial film growth.With its distinguished editors and international team of contributors, In situ characterization of thin film growth is a standard reference for materials scientists and engineers in the electronics and photonics industries, as well as all those with an academic research interest in this area.
In Situ Characterization of Thin Film Growth features in the following genres: Materials science, Electronic devices and materials, Electronics engineering
In Situ Characterization of Thin Film Growth is available in Hardback
In Situ Characterization of Thin Film Growth was written by Gertjan Professor, MESA+ Institute for Nanotechnology,University of Twente, Enschede, The Netherlands Koster and published by Woodhead Publishing Ltd an imprint of Elsevier Science & Technology
In Situ Characterization of Thin Film Growth has 296 pages
Yes it is part of Woodhead Publishing Series in Electronic and Optical Materials series