This book is aimed at new and experienced engineers, technology managers, and senior technicians who want to enrich their understanding of the image formation physics of a lithographic system. Readers will gain knowledge of the basic equations and constants that drive optical lithography, learn the basics of exposure systems and image formation, and come away with a full understanding of system components, processing, and optimization.
Readers will also get a primer on the outlook of optical lithography and the many next-generation technologies that may greatly enhance semiconductor manufacturing in the near future. Topics covered in this title include:
| ISBN: | 9780819475602 |
| Publication date: | 30th April 2010 |
| Author: | Burn Jeng Lin |
| Publisher: | SPIE an imprint of SPIE Press |
| Format: | Paperback |
| Pagination: | 477 pages |
| Series: | Press Monographs |
| Genres: |
Applied optics |
This book is aimed at new and experienced engineers, technology managers, and senior technicians who want to enrich their understanding of the image formation physics of a lithographic system. Readers will gain knowledge of the basic equations and constants that drive optical lithography, learn the basics of exposure systems and image formation, and come away with a full understanding of system components, processing, and optimization.
Optical Lithography features in the following genres: Applied optics
Hardback, Paperback. Not Available.
Optical Lithography was written by Burn Jeng Lin and published by SPIE an imprint of SPIE Press
Optical Lithography has 477 pages
Yes it is part of Press Monographs series