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Develops detailed understanding of the deposition and etching of materials by sputtering discharge, and of etching of materials by chemically active discharge. Treats glow discharge at several levels from basic phenomena to industrial applications--practical techniques diligently related to fundamentals. Subjects range from voltage, distributions encountered in plasma etching systems to plasma-electron interactions that contribute to sustaining the discharge.
|Publication date:||5th November 1980|
|Publisher:||John Wiley & Sons Inc an imprint of John Wiley and Sons Ltd|
|Categories:||Electricity, electromagnetism & magnetism,|