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EUV Sources for Lithography

by Vivek Bakshi

Part of the Press Monographs Series

EUV Sources for Lithography Synopsis

This comprehensive volume, edited by a senior technical staff member at SEMATECH, is the authoritative reference book on EUV source technology. The volume contains 38 chapters contributed by leading researchers and suppliers in the EUV source field. Topics range from a state-of-the-art overview and in-depth explanation of EUV source requirements, to fundamental atomic data and theoretical models of EUV sources based on discharge-produced plasmas (DPP) and laser-produced plasmas, to a description of prominent DPP and LPP designs and other technologies for producing EUV radiation. Additional topics include EUV source metrology and components (collectors, electrodes), debris mitigation, and mechanisms of component erosion in EUV sources. The volume is intended to meet the needs of both practitioners of the technology and readers seeking an introduction to the subject.

Book Information

ISBN: 9780819458452
Publication date: 30th November 2005
Author: Vivek Bakshi
Publisher: SPIE Press
Format: Hardback
Pagination: 900 pages
Categories: Printing & reprographic technology, Applied optics,

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